Saito, Yuta; Higashihara, Tomoya; Ueda, Mitsuru published the artcile< Highly refractive and photosensitive polyimide>, Application of C8H3ClO3, the main research area is refractive photosensitive polyimide.
A highly refractive sulfur-containing photosensitive polyimide (PSPI) based on the PI from 4,4′-[p-thiobis(phenylenesulfanyl)]diphthalic anhydride (3SDEA) and 4,4′-thiodianiline (SDA), 4,4′-methylenebis[2,6-bis(methoxymethyl)phenol] (MBMP) as a crosslinker, and (5-propylsulfonyloxyimino-5H-thiophen-2-ylidene)-(2-methylphenyl)acetonitrile (PTMA) as a photoacid generator has been developed. The matrix polymer showed high transparency in the g-line region and the high reflective index of 1.7452 and low birefringence of 0.0081. The PSPI consisting of the PI (84.8 wt%), MBHP (11.0 wt%), and PTMA (4.2 wt%) exhibited the high sensitivity (D0.5) of 36 mJ/cm2 and good contrast (γ0.5) of 5.1, resp., producing a clear neg.-tone line-and-space pattern with 8-μm resolution
Journal of Photopolymer Science and Technology published new progress about Dissolution. 118-45-6 belongs to class chlorides-buliding-blocks, and the molecular formula is C8H3ClO3, Application of C8H3ClO3.
Referemce:
Chloride – Wikipedia,
Chlorides – an overview | ScienceDirect Topics