In organic chemistry, atoms other than carbon and hydrogen are generally referred to as heteroatoms. The most common heteroatoms are nitrogen, oxygen and sulfur. Now I present to you an article called Recent advances in acetal-based DUV resists, published in 1999, which mentions a compound: 35836-73-8, mainly applied to acetal derivatized hydroxystyrene polymer photoresist phys lithog property, Quality Control of 2-((1R,5S)-6,6-Dimethylbicyclo[3.1.1]hept-2-en-2-yl)ethanol.
Phys. and lithog. properties of structurally diverse acetal-derivatized hydroxy styrene polymers are reported. The dissolution and thermal properties of the acetal – blocked-polymers vary with the size of the pendent acetal moiety. The lithog. performance of the resists containing “”bulky”” acetal-derivatized polymers was found to be superior to those containing non-bulky acetal functionalized polymers. In the cases where the acidolysis products of the bulky acetal-based polymers are non-volatile alcs., the post-exposure volatilization, film shrinkage and plasma etch resistance were found to be significantly improved. Bulky acetal-derivatized polymers also show excellent thermal and shelf life stability.
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Reference:
Chloride – Wikipedia,
Chlorides – an overview | ScienceDirect Topics